Tender, extract
ICP3 Ion etching system FIRST ETH Zurich
- Contracting authority
- ETH Zürich - Abt. Procurement & Export Services
- Place
- Canton ZH
- Submission deadline
- No deadline given
- Published
- 15.03.2025
- Procedure
- Open procedure
- Type
- Supply
- Project number
- 4823
- CPV code
- 38000000 Laboratory, optical and precision equipments (excl. glasses)
Description
Delivery of a reactive ion etching system with inductively coupled plasma, consisting of a gas supply system for at least 9 gases, with process pressure up to 100 mtorr and gas flows up to 500 sccm, RF/ICP generators in the kW range with autotuning, spectroscopic monitoring of the plasma, automatic loading lock for fast loading, for sample sizes from 4 inch diameter, with sample temperature control in the range from 10 to 300 °C.
Links
- This tender in TEXFY: https://www.texfy.ch/en/ausschreibungen/ea92da6f-8c3d-4978-b975-f3d7579d57d7
- Official publication: https://www.simap.ch/en/project-detail/bc0a3ccd-35a0-4853-9a03-2e217eab5db7