Die Zuschlagsempfängerin hat die höchste Punktzahl aller eingereichten Angebote erzielt. Insbesondere bei den Lebenszykluskosten wie Unterhaltskosten und Energieverbrauch war ihr Angebot das beste.
- Supply
ICP3 Ion etching system FIRST ETH Zurich
- Location
- Canton ZH
- Procuring office
- ETH Zürich - Abt. Procurement & Export Services
- Requesting office
- ETH Zürich - FIRST-Lab
Awarded
Awarded to
- Oxford Instruments GmbH, WiesbadenEUR 482’245.00
What is being procured?
Scope of work
Delivery of a reactive ion etching system with inductively coupled plasma, consisting of a gas supply system for at least 9 gases, with process pressure up to 100 mtorr and gas flows up to 500 sccm, RF/ICP generators in the kW range with autotuning, spectroscopic monitoring of the plasma, automatic loading lock for fast loading, for sample sizes from 4 inch diameter, with sample temperature control in the range from 10 to 300 °C.
Key facts, codes and options
Key facts, codes and options
- Type of contract
- Supply
- Type of supply
- Purchase
- Procedure
- Open procedure
- Trades
- Not evident from the available publication data.
- CPV
- CPV 38000000 – Laboratory, optical and precision equipments (excl. glasses)
- Options
- Not evident from the available publication data.
- Variants
- Not evident from the available publication data.
- Partial offers
- Not evident from the available publication data.
TEXFY assessment: Products, installations, quantities, technical specifications and exclusions are not structured fields of the publication. TEXFY does not analyse the free text on them: check the original text and the tender documents.
Official source
- simap project number
- 4823
- Publication number
- 4823-02
- Covered by international agreements
- Yes
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