Die Zuschlagsempfängerin hat die höchste Gesamtpunktzahl erreicht und konnte insbesondere in den vorteilhafteren Lebenszykluskosten und in der höheren technischen Reife der angebotenen Lösung überzeugen.
- Supply
Thin Film Cluster Deposition System for Sputtering of Metals and Dielectrics
- Location
- Canton ZH
- Procuring office
- ETH Zürich - Abt. Procurement & Export Services
- Requesting office
- ETH Zürich - B & R Nanotechnology Center (BRNC)
Awarded
Awarded to
- Evatec AG, TrübbachCHF 2’870’055.00
What is being procured?
Scope of work
Thin-film cluster coating system for sputtering metals and dielectrics Cluster system with an airlock and 4 process chambers (PCs) for DC and RF sputtering of dielectrics and metals on semiconductors and other substrates. Please refer to our specification for details.
Key facts, codes and options
Key facts, codes and options
- Type of contract
- Supply
- Type of supply
- Purchase
- Procedure
- Open procedure
- Trades
- Not evident from the available publication data.
- CPV
- CPV 38000000 – Laboratory, optical and precision equipments (excl. glasses)
- Options
- Not evident from the available publication data.
- Variants
- Not evident from the available publication data.
- Partial offers
- Not evident from the available publication data.
TEXFY assessment: Products, installations, quantities, technical specifications and exclusions are not structured fields of the publication. TEXFY does not analyse the free text on them: check the original text and the tender documents.
Official source
- simap project number
- 7527
- Publication number
- 7527-02
- Covered by international agreements
- Yes
More in the guide
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